|
Polyimide & High Viscosity Photoresist Spin Coatin
|
wonyoul shin |
wonyoul.shin@kanc.re.kr |
|
E-beam Lithography II (양자팹)
|
changhwan kim |
changhwan.kim@kanc.re.kr |
|
Maskless Lithography (양자팹)
|
changhwan.kim |
changhwan.kim@kanc.re.kr |
|
E-beam Lithography I(양자팹)
|
Gyeongpyo Kim |
gyeongpyo.kim@kanc.re.kr |
|
Track VII(4-6inch)
|
Gyeongpyo Kim |
gyeongpyo.kim@kanc.re.kr |
|
Contact Aligner VIII
|
Heekwan Lee |
heekwan.lee@kanc.re.kr |
|
I-line Stepper II(양자팹)
|
Minchul Jang |
minchul.jang@kanc.re.kr |
|
Automated Mask Aligner IV (8 inch)
|
Heekwan Lee |
heekwan.lee@kanc.re.kr |
|
CD SEM
|
Juyoung An |
juyoung.an@kanc.re.kr |
|
Spin Coater II
|
Daehoon Kang |
daehoon.kang@kanc.re.kr |
