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Main Equipments

Nano Litho Pattern Line

  • Supporting the demand of nano patterning(Class 1, NIST-A Zone)
  • Supporting the process of mask stage by stage
Category Equipment Model(Maker)
Photo E-beam lithography I (9300) JBX9300FS(JEOL)
E-beam lithography II (6000) JBX6000FS/E(JEOL)
KrF Stepper PAS5500/300C(ASML)
Mask Aligner(Auto) MA150e(Karl suss)
Mask Aligner I (R&D) EVG620(EVG)
E-beam curing machine ElctronCure 30TMx
Measurement/Analysis AFM I XE150(PSIA)
FE SEM I S-4800(Hitachi)

Nano R&D Support Line

  • Supporitng R&D of nano electronic & photonic devices
  • Supporting the basic research and aplications
Category Equipment Model(Maker)
Etch ICP etcher I(R&D) Multiplex ICP(STS)
ICP etcher IV(R&D) ICP 380(Oxford System)
Thin Film E-beam evaporator II(R&D) UEE(ULTECH)
RTA(R&&D) RTA150H-SVP1(NYM TECH)
PE(HDP)-CVD(R&D) High-DEP(BMR)
Sputter(R&D) SPS series(ULTECH)
MOCVD AIX200/4RF(ALXTRON)
Wet Cleaning R&D Wet-station II Designed for KANC(ATIS)

Nano Device Process Intergration Line

  • Producing the nano electronic devices focus on 6" compound semiconductor
  • Business oriented pilot scale production and Foundry service
Category Equipment Model(Maker)
Thin Film E-beam evaporator I (foundry) EI-5(ULVAC)
PECVD II (foundry) VL-LA-PECVD(Unaxis)
Microwave asher (foundry) Enviro II(ULVAC)
Sputter(Cluster) (foundry) SME-200J(ULVAC)
Au Plating Machine I & II SWP-C3D(Sungwon Forming)
Liftoff Machine VL-6020(M.SETEK)
Spin Etcher VE-8200(M.SETEK)
Etch ICP etcher II(foundry) VL-ICP(Unaxis)
RIE(foundry) VL-PHF-RIE(Unaxis)

Measurement & Analysis Lab

  • Evaluating characteristics of nanomaterials and products
  • Supporting nano structure & surface analysis, Testing samples
Category Equipment Model(Maker)
Measurement/Analysis AFM II XE100(PSIA)
AFM III XE100(PSIA)
FE SEM II S-4300SE(Hitachi)
PL mapper RPM2000(Accent)
Hall Measurement HL5500PC(Accent)
Doping profiler ECVpro(Accent)
FT-IR Nicolet5700(Thermo electron corp.)
XRD D8 DISCOVER(Bruker)
CL MONO CL3(GATAN)
Spectro Photometer Cary5000(Varian)