Main Equipments
Nano Litho Pattern Line
- Supporting the demand of nano patterning(Class 1, NIST-A Zone)
- Supporting the process of mask stage by stage
| Category | Equipment | Model(Maker) |
|---|---|---|
| Photo | E-beam lithography I (9300) | JBX9300FS(JEOL) |
| E-beam lithography II (6000) | JBX6000FS/E(JEOL) | |
| KrF Stepper | PAS5500/300C(ASML) | |
| Mask Aligner(Auto) | MA150e(Karl suss) | |
| Mask Aligner I (R&D) | EVG620(EVG) | |
| E-beam curing machine | ElctronCure 30TMx | |
| Measurement/Analysis | AFM I | XE150(PSIA) |
| FE SEM I | S-4800(Hitachi) |
Nano R&D Support Line
- Supporitng R&D of nano electronic & photonic devices
- Supporting the basic research and aplications
| Category | Equipment | Model(Maker) |
|---|---|---|
| Etch | ICP etcher I(R&D) | Multiplex ICP(STS) |
| ICP etcher IV(R&D) | ICP 380(Oxford System) | |
| Thin Film | E-beam evaporator II(R&D) | UEE(ULTECH) |
| RTA(R&&D) | RTA150H-SVP1(NYM TECH) | |
| PE(HDP)-CVD(R&D) | High-DEP(BMR) | |
| Sputter(R&D) | SPS series(ULTECH) | |
| MOCVD | AIX200/4RF(ALXTRON) | |
| Wet Cleaning | R&D Wet-station II | Designed for KANC(ATIS) |
Nano Device Process Intergration Line
- Producing the nano electronic devices focus on 6" compound semiconductor
- Business oriented pilot scale production and Foundry service
| Category | Equipment | Model(Maker) |
|---|---|---|
| Thin Film | E-beam evaporator I (foundry) | EI-5(ULVAC) |
| PECVD II (foundry) | VL-LA-PECVD(Unaxis) | |
| Microwave asher (foundry) | Enviro II(ULVAC) | |
| Sputter(Cluster) (foundry) | SME-200J(ULVAC) | |
| Au Plating Machine I & II | SWP-C3D(Sungwon Forming) | |
| Liftoff Machine | VL-6020(M.SETEK) | |
| Spin Etcher | VE-8200(M.SETEK) | |
| Etch | ICP etcher II(foundry) | VL-ICP(Unaxis) |
| RIE(foundry) | VL-PHF-RIE(Unaxis) |
Measurement & Analysis Lab
- Evaluating characteristics of nanomaterials and products
- Supporting nano structure & surface analysis, Testing samples
| Category | Equipment | Model(Maker) |
|---|---|---|
| Measurement/Analysis | AFM II | XE100(PSIA) |
| AFM III | XE100(PSIA) | |
| FE SEM II | S-4300SE(Hitachi) | |
| PL mapper | RPM2000(Accent) | |
| Hall Measurement | HL5500PC(Accent) | |
| Doping profiler | ECVpro(Accent) | |
| FT-IR | Nicolet5700(Thermo electron corp.) | |
| XRD | D8 DISCOVER(Bruker) | |
| CL | MONO CL3(GATAN) | |
| Spectro Photometer | Cary5000(Varian) |